Research Letters

The influence of deposition temperature on vanadium dioxide thin films microstructure and physical properties

Velaphi Msomi, Oaisin Nemraoui
South African Journal of Science | Vol 106, No 11/12 | a297 | DOI: | © 2010 Velaphi Msomi, Oaisin Nemraoui | This work is licensed under CC Attribution 4.0
Submitted: 28 May 2010 | Published: 18 November 2010

About the author(s)

Velaphi Msomi, Cape Peninsula University of Technology, South Africa
Oaisin Nemraoui, University of Zululand, South Africa


Vanadium dioxide thin films were successfully prepared on soda lime glass substrates using the optimised conditions for r.f-inverted cylindrical magnetron sputtering. The optimised deposition parameters were fixed and then a systematic study of the effect of deposition temperature, ranging from 450 °C to 550 °C, on the microstructure of thermochromic thin films was carried out. The deposited films were found to be well crystallised, showing strong texture corresponding to the (011) plane, indicating the presence of vanadium dioxide.


deposition temperature; microstructure; thermochromism; thin films; vanadium dioxide


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