Research Letters

Microwave plasma-enhanced chemical vapour deposition growth of carbon nanostructures

Shivan R. Singh, A.L. Leigh Jarvis
South African Journal of Science | Vol 106, No 5/6 | a183 | DOI: https://doi.org/10.4102/sajs.v106i5/6.183 | © 2010 Shivan R. Singh, A.L. Leigh Jarvis | This work is licensed under CC Attribution 4.0
Submitted: 30 March 2010 | Published: 31 March 2010

About the author(s)

Shivan R. Singh, School of Electrical, Electronic and Computer Engineering, University of KwaZulu-Natal, South Africa
A.L. Leigh Jarvis, School of Electrical, Electronic and Computer Engineering, University of KwaZulu-Natal, South Africa

Abstract

The effect of various input parameters on the production of carbon nanostructures using a simple microwave plasma-enhanced chemical vapour deposition technique has been investigated. The technique utilises a conventional microwave oven as the microwave energy source. The developed apparatus is inexpensive and easy to install and is suitable for use as a carbon nanostructure source for potential laboratory-based research of the bulk properties of carbon nanostructures. A result of this investigation is the reproducibility of specific nanostructures with the variation of input parameters, such as carbon-containing precursor and support gas flow rate. It was shown that the yield and quality of the carbon products is directly controlled by input parameters. Transmission electron microscopy and scanning electron microscopy were used to analyse the carbon products; these were found to be amorphous, nanotubes and onion-like nanostructures.

Keywords

amorphous carbon reduction; carbon nanotubes; hydrogen- to-carbon ratio; microwave plasma- enhanced chemical vapour deposition; nanostructures

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